Seminar & Colloquium
[세미나: 11월 3일(금), 오전 11시] Dr.Patrick Naulleau, Director of the Center for X-ray Optic at Lawrence Berkeley National Laboratory
Title
Optical theory in the EUV/soft-x-ray regime
Speaker
Dr.Patrick Naulleau, Director of the Center for X-ray Optic at Lawrence Berkeley National Laboratory
Biography
Patrick Naulleau received his B.S. and M.S. degrees in electrical engineering from the Rochester Institute of Technology, Rochester, NY, in 1991 and 1993, respectively. He received his Ph.D. in electrical engineering from the University of Michigan, Ann Arbor in 1997 specializing in optical signal processing and coherence theory. In 1997 Dr. Naulleau joined Berkeley Lab on the EUV LLC program building the world’s first EUV scanner. From June 2005 through March 2008, Dr. Naulleau additionally joined the faculty at the University at Albany, SUNY as Associate Professor, also concentrating in the area of EUV lithography. In April 2010 Dr. Naulleau took the position of Director of the Center for X-ray Optic at Lawrence Berkeley National Laboratory. In August 2022, Dr. Naulleau became CEO of EUV Tech Inc., a leading supplier of EUV metrology equipment. Dr. Naulleau has over 390 publications as well as 19 Patents and is a Fellow of OSA (now Optica) and SPIE.
| Date | Friday, November 3th, 2023
| Time | 11:00
| Venue | 33동 222호(DB세미나실)
[Abstract]
In this seminar, I will introduce the key scientific concepts underlying EUV/soft-x- ray optics and and use those concepts to explore practical implications on the design and implementation of imaging system in the EUV/soft-x-ray regime. Topics to be covered will include the optical properties of materials in the EUV regime, the role of partial coherence in EUV systems and implications on light source requirements, implications of pushing EUV resolution to the low-k1 and high-NA regimes including the role of polarization as well as unique challenges related to the application of phase shift masks in the EUV regime.
| Host | 이명재 교수(02-880-5819)