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Ki-Bum Kim
Fabrication of Nanostructures and Devices

Stanford University: Ph.D. in Materials Science and Engineering (1990)
Mailstop 131-108   
Phone: +82-2-880-7095    Fax: +82-2-885-5820
- Stanford University: Ph.D. in Materials Science and Engineering (1990)
- Seoul National University: M.S. in Metallurgical Engineering (1983)
- Seoul National University: B.S. in Metallurgical Engineering (1980)
- Seoul National University, Professor (1992-present)
- Applied Materials Inc., Research Scientist (1991-1992)
- Philips Research Laboratory, Research Scientist (1988-1991)
The major research area of Prof. Kim is to investigate the structure and property relationship in thin film materials.In particular, he is actively working on the development of metallization processes for the next generation Integrated Circuits (ICs) including the development of silicides (titanium silicide and cobalt silicide), diffusion barriers (titanium nitrides and tantalum nitrides), and interconnect (aluminum and copper) materials and processes. He is also working on other applications of thin films such as polycrystalline Si thin film transistor, electrode for the dielectrics, and diamond field electron emitters.
◑Jung-Sub Wi, Tae-Yon Lee, Hyun-Mi Kim, Hyo-Sung Lee, Sung-Wook Nam, Il Jae Shin, Kyung Ho Shin, and Ki-Bum Kim, “Guided formation of sub-10 nm silicide dot array on electron beam lithographically patterned area”, Adv. Mater., accepted (2007).
◑Min-Ho Kwon, Bong-Sub Lee, Stephanie N. Bogle, Lakshmi N. Nittala, Stephen G. Bishop, John R. Abelson, Simone Raoux, Byung-ki Cheong, and Ki-Bum Kim, "Nanometer-scale order in amorphous Ge2Sb2Te5 analyzed by fluctuation electron microscopy", Appl. Phys. Lett., 90, 021923 (2007).
◑Tae-Yon Lee, Sung-Soo Yim, Dongbok Lee, Min-Hyun Lee, Dong-Ho Ahn, and Ki-Bum Kim, "Separate domain formation in Ge2Sb2Te5?SiOx mixed layer", Appl. Phys. Lett., 89, 163503 (2006).
◑Ki-Su Kim, Moon-Sang Lee, Sung-Soo Yim, Hyun-Mi Kim, Ki-Bum Kim, Hyung-Sang Park, Woonyong Koh, Wei-Min Li, Maarten Stokhof, Hessel Sprey, "Evaluation of integrity and barrier performance of atomic layer deposited WNxCy films on plasma enhanced chemical vapor deposited SiO2 for Cu metallization", Appl. Phys. Lett., 89. 081913 (2006).
◑Sung-Soo Yim, Moon-Sang Lee, Ki-Su Kim, and Ki-Bum Kim, "Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications", Appl. Phys. Lett., 89, 093115 (2006).